plasma deposition meaning in Chinese
等离子沉积
Examples
- Calculation model for plasma deposition with an assistant laser effect
激光辅助大气等离子弧堆焊射流场计算模型 - Properties of diamond - like carbon films prepared by pulse - arc plasma deposition
脉冲多弧离子镀制备类金刚石薄膜的特性 - Pulsed , filtered cathode arc plasma deposition ( pfcapd ) is a new deposition technology for a range of metals and compounds films free of the microdroplets associated with conventional arc evaporation , and it seems as one of the best methods to deposition hydrogen - free diamond like carbon which has widespread applications for its unique properties
脉冲磁过滤阴极弧等离子体沉积由于能很好地过滤液滴，沉积几乎所有金属及其合金薄膜材料，尤其能沉积极有应用前景的类金刚石膜及用于微电子工业的铜内连材料，日益受到重视。 - A superalloy double helix integrated impeller with good performances of dimensional precision , microstructure and mechanics was rapidly manufactured by hpdm ( hybrid plasma deposition & milling ) method proposed by author ' s , laboratory , which synthesized plasma deposition as an additive technology , and milling as a subtractive technique during the processing
摘要采用等离子熔积与铣削复合制造技术，在等离子熔积成形过程中复合铣削精整，试制了难加工高温合金双螺旋整体叶轮样件，其组织性能和力学性能均高于采用传统工艺加工获得的叶轮。